发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR CIRCUIT DEVICE, SEMICONDUCTOR CIRCUIT DEVICE, AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor circuit device capable of easily stabilizing electrical connection between the semiconductor circuit device and an external apparatus; and the like. <P>SOLUTION: This method of manufacturing a semiconductor circuit device includes: a semiconductor circuit formation process; a first removal process of removing a part of an insulation layer 140 surrounding a semiconductor circuit 160, dividing the insulation layer 140 into a first insulation part 140 in contact with the semiconductor circuit 160 and a second insulation part 140b separated from the first insulation part 140, and forming a side face of the second insulation part 140b on the semiconductor circuit 160 side into an inclined surface; a passivation layer formation process; a second removal process of removing a part of the second insulation part 140b and a part of the passivation layer 180 in a direction vertical to a substrate surface of a transfer source substrate 100; an adhesive hardening process of sticking the transfer source substrate 100 to a transfer destination substrate; and a peeling process of peeling the transfer source substrate 100 and the second insulation part 140b from the transfer destination substrate and the like. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011066130(A) 申请公布日期 2011.03.31
申请号 JP20090214542 申请日期 2009.09.16
申请人 SEIKO EPSON CORP 发明人 IRIGUCHI CHIHARU
分类号 H01L21/60;H01L21/3205;H01L23/52 主分类号 H01L21/60
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