HYDROPHOBIC TREATMENT APPARATUS, HYDROPHOBIC TREATMENT METHOD, PROGRAM, AND COMPUTER STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To improve the throughput of a substrate treatment by efficiently performing a hydrophobic treatment on a surface of a substrate.

SOLUTION: A hydrophobic treatment apparatus 90 includes a placing table 120 on which a wafer W is mounted. A gas supply port 130 for supplying an HMDS gas to a surface of the wafer W is provided above the placing table 120. The gas supply port 130 is connected to a gas production device 131 which produces the HMDS gas through a gas supply pipe 132. A light irradiation portion 160 which irradiates HMDS on the wafer W with light to bring the HMDS into contact with the surface of the wafer W is provided obliquely above the placing table 120. An optical filter 161 which transmits only light of 250 to 2,500 nm in wavelength is disposed between the placing table 120 and the light irradiation part 160.

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