发明名称 NONVOLATILE MEMORY DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device having a structure in which memory cells adjoining each other in a height direction share a word line or a bit line, the nonvolatile memory device being made less in number of processes of forming contacts provided to the nonvolatile memory device than before. SOLUTION: The nonvolatile memory device includes a plurality of bit line contacts BC each connected to one of bit lines BL and a plurality of word line contacts WC each connected to a word line WL, wherein the bit line contacts BC and the word line contacts WC have a plurality of contact parts 81 to 83 formed penetrating contact layers corresponding to formation positions of a plurality of memory layers and connection wiring parts 41-1 and 41-2 connecting the contact parts 81 to 83 adjoining one another in the height direction, and the connection wiring parts 41-1 and 41-2 are formed in contact layers of the same heights between the bit line contacts BC and word line contacts WC. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011066143(A) 申请公布日期 2011.03.31
申请号 JP20090214732 申请日期 2009.09.16
申请人 TOSHIBA CORP 发明人 SONODA MASAHISA;HAYASHI KATSUMASA
分类号 H01L27/10;H01L21/768;H01L45/00;H01L49/00 主分类号 H01L27/10
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