| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterned crystalline semiconductor thin film which can be manufactured without using a photoresist and be directly drawn into a desired shape. SOLUTION: There is provided the patterned crystalline semiconductor thin film, obtained by forming an amorphous thin film comprising indium oxide as a main component, crystallizing a part of the amorphous thin film to allow the part to be a semiconductor, and removing an amorphous part of the partially crystallized thin film by etching. COPYRIGHT: (C)2011,JPO&INPIT
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