发明名称 DEFECT INSPECTION DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To solve the problem wherein the load of a worker is large and work efficiency is low. SOLUTION: An acquisition unit 11 acquires a pattern image which represents a semiconductor pattern. An input unit 12 receives the field size of a drawing field and the width of the joint of the drawing field. A control unit 14 specifies the non-inspection region being the region on the semiconductor pattern corresponding to the joint on the basis of the field size and the width of the joint received by the input unit 12. An inspection unit 15 inspects at least the flaw in a final inspection region excepting the non-inspection region, which is specified by the control unit 14, from the semiconductor pattern using the pattern image acquired by the acquisition unit 11 and outputs final inspection results showing the flaw in the final inspection region. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011064576(A) 申请公布日期 2011.03.31
申请号 JP20090215563 申请日期 2009.09.17
申请人 ELPIDA MEMORY INC 发明人 OKUDA NAO
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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