发明名称 HIGH COUPLING MEMORY CELL
摘要 A first dielectric layer is formed over a substrate. A single layer first conductive layer that acts as a floating gate is formed over the first dielectric layer. A trough is formed in the first conductive layer to increase the capacitive coupling of the floating gate with a control gate. An intergate dielectric layer is formed over the floating gate layer. A second conductive layer is formed over the second dielectric layer to act as a control gate.
申请公布号 US2011073929(A1) 申请公布日期 2011.03.31
申请号 US20100962012 申请日期 2010.12.07
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU SUKESH;SANDHU GURTEJ S.
分类号 H01L29/788 主分类号 H01L29/788
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