CLEANING METHOD, CLEANING SYSTEM, AND METHOD FOR MANUFACTURING MICROSTRUCTURE

摘要

PURPOSE: A cleaning method, a cleaning system, and a method for manufacturing a microstructure are provided to improve exfoliation from a resist which is formed in a deformation layer by supplying a solution including inorganic acid and oxide material to the surface of a target to be cleaned. CONSTITUTION: In a cleaning method, a cleaning system, and a method for manufacturing a microstructure, an oxide solution including oxide material by electrolyzing a dilute sulfuric acid solution(S1-1). The temperature of the oxide solution is adjusted(S1-2) The temperature of an inorganic acid liquid of high concentration is adjusted(S2). The inorganic acid liquid of high concentration and the oxide solution are supplied to the surface of a target to be cleaned(S3). The sulphuric acid concentration of the dilute sulfuric acid solution is over 30 w%.