METHOD FOR PRODUCING SPUTTERING TARGET COMPRISING CU-GA ALLOY

摘要

PURPOSE: A method for producing sputtering target comprising Cu-Ga alloy is provided to manufacture high performance thin film by clashing the inactive gas of plasma state with a sputtering target. CONSTITUTION: A method for producing sputtering target comprising Cu-Ga alloy is as follows. A Cu-Ga alloy slab(15) is cut by wire electrospark to make the desire thickness of a sputtering target. The sputtering surface of the cut cross section of Cu-Ga alloy slab is polished. The surface of sputtering target shape is polished to desired surface smoothness.