| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that prevents the occurrence of a trouble in an exposure apparatus during exposure treatment executed by an immersion method, a substrate treatment system, and an inspection/periphery exposure apparatus. <P>SOLUTION: An edge exposure part EEW includes: a projection part 510; a projection part holding unit 520; a substrate rotating unit 540; an outer peripheral edge detecting unit 550; and a surface inspection treatment unit 580. Each part of the projection part holding unit 520 is operated to move the projection part 510 in an X-direction and a Y-direction. The projection part 510 irradiates a peripheral edge of a substrate W with light transmitted from an exposure light source through a light guide. Edge sampling treatment is performed on the basis of a distribution of an amount of light received in a CCD line sensor 553 of the outer-peripheral edge detecting unit 550. Surface inspection treatment is performed on the basis of a distribution of an amount of light received in a CCD line sensor 583 of the surface inspection treatment unit 580. <P>COPYRIGHT: (C)2011,JPO&INPIT |
