STRUCTURE AND METHOD FOR SEMICONDUCTOR TESTING

摘要

An embodiment of a test structure in accordance with the present invention comprises a pair of interdigitated comb portions of a metallization layer present in a recess of an inter-layer dielectric (ILD) formed over a polysilicon heater element. A third portion of the metallization layer comprises a serpentine metal line interposed between the comb portions. Application of force voltages, and detection of sense voltages, at various nodes of the metallization portions allows identification of the following: (1) electromigration of metal in the metallization portions; (2) extrusion of metal from one metallization portion to contact another; (3) breakdown voltage (Vbd) and time dependent dielectric breakdown (TDDB) of the ILD; (4) contamination in the metallization portions with mobile ions; and (5) k valve and drift in k value of the ILD. A bias voltage may be applied to the polysilicon heater to accomplish temperature control during testing.