发明名称 |
ARRANGEMENTS AND METHODS FOR IMPROVING BEVEL ETCH REPEATABILITY AMONG SUBSTRATES |
摘要 |
A method, performed in connection with bevel etching of a substrate, for improving bevel- etch repeatability among substrates, is disclosed. The method includes providing an optical arrangement and ascertaining at least one bevel edge characteristic of a bevel edge of said substrate. The method also includes deriving at least one compensation factor from said at least one bevel edge characteristic, said at least one compensation factor pertaining to an adjustment in a bevel etch process parameter. The method further includes performing said bevel etching utilizing said at least one compensation factor. |
申请公布号 |
WO2010133989(A3) |
申请公布日期 |
2011.03.31 |
申请号 |
WO2010IB51945 |
申请日期 |
2010.05.04 |
申请人 |
LAM RESEARCH CORPORATION;LAM RESEARCH AG;FISCHER, ANDREAS;SHIN, NEUNGHO;CAMARGO, FRANSISCO |
发明人 |
FISCHER, ANDREAS;SHIN, NEUNGHO;CAMARGO, FRANSISCO |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|