发明名称 TARGET FOR A SPUTTERING PROCESS FOR MAKING A COMPOUND FILM LAYER OF A THIN SOLAR CELL, METHOD OF MAKING THE THIN FILM SOLAR CELL, AND THIN FILM SOLAR CELL MADE THEREBY
摘要 A target adapted for a sputtering process for making a compound film layer of a thin film solar cell includes a composition having a formula of CuB1-xCxSeyS2-y, wherein B and C are independently selected from Group IIIA elements; x ranges from 0 to 1; and y ranges from 0 to 2. A thin film solar cell made by sputtering using the target and a method of making the thin film solar cell are also disclosed. Specifically, the thin film solar cell includes a compound film formed with substantially columnar grains. The energy gap of the compound film layer may be varied using different work pressures during a sputtering process. At least one interlayer may be included in the compound film layer to control the size of columnar grains in the compound film layer.
申请公布号 US2011073186(A1) 申请公布日期 2011.03.31
申请号 US20100880481 申请日期 2010.09.13
申请人 LAI CHIH-HUANG;CHEN CHIA-HSIANG;CHEN YI-CHANG 发明人 LAI CHIH-HUANG;CHEN CHIA-HSIANG;CHEN YI-CHANG
分类号 H01L31/0272;C23C14/14;C23C14/34;H01B1/02 主分类号 H01L31/0272
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