发明名称 |
TARGET FOR A SPUTTERING PROCESS FOR MAKING A COMPOUND FILM LAYER OF A THIN SOLAR CELL, METHOD OF MAKING THE THIN FILM SOLAR CELL, AND THIN FILM SOLAR CELL MADE THEREBY |
摘要 |
A target adapted for a sputtering process for making a compound film layer of a thin film solar cell includes a composition having a formula of CuB1-xCxSeyS2-y, wherein B and C are independently selected from Group IIIA elements; x ranges from 0 to 1; and y ranges from 0 to 2. A thin film solar cell made by sputtering using the target and a method of making the thin film solar cell are also disclosed. Specifically, the thin film solar cell includes a compound film formed with substantially columnar grains. The energy gap of the compound film layer may be varied using different work pressures during a sputtering process. At least one interlayer may be included in the compound film layer to control the size of columnar grains in the compound film layer.
|
申请公布号 |
US2011073186(A1) |
申请公布日期 |
2011.03.31 |
申请号 |
US20100880481 |
申请日期 |
2010.09.13 |
申请人 |
LAI CHIH-HUANG;CHEN CHIA-HSIANG;CHEN YI-CHANG |
发明人 |
LAI CHIH-HUANG;CHEN CHIA-HSIANG;CHEN YI-CHANG |
分类号 |
H01L31/0272;C23C14/14;C23C14/34;H01B1/02 |
主分类号 |
H01L31/0272 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|