| 摘要 |
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed magnetron sputtering to condense on the substrate. The pulses of the magnetron have a peak power density of more than 1.5 kW/cm2, the pulses of the magnetron have a duration of≰200μs, and the average increase in current density during ignition of the plasma within an interval, which is≰0.025 ms, is at least 106 A/(ms cm2). |
