发明名称 |
UV NANOIMPRINT METHOD, RESIN REPLICA MOLD AND METHOD FOR PRODUCING THE SAME, MAGNETIC RECORDING MEDIUM AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING/REPRODUCING APPARATUS |
摘要 |
A UV nanoimprint method comprising performing compression molding by pressing a mold having a pattern formed on the surface thereof against a work prepared by forming a thin film composed of an ultraviolet-curable resin on a substrate, and irradiating with ultraviolet light, either concurrently with the compression molding or after the compression molding, thereby transferring the pattern to the thin film, wherein the ultraviolet light is irradiated using an ultraviolet light irradiation apparatus equipped with temperature rise suppression means, and a light source that does not continuously emit heat rays together with ultraviolet light is used as a light source of the ultraviolet light irradiation apparatus. |
申请公布号 |
EP2256788(A4) |
申请公布日期 |
2011.03.30 |
申请号 |
EP20090716212 |
申请日期 |
2009.03.06 |
申请人 |
SHOWA DENKO K.K. |
发明人 |
UCHIDA, HIROSHI;FUKUSHIMA, MASATO;SAKATA, YUKO |
分类号 |
H01L21/027;B29C59/02;G03F7/00;G11B5/855 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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