发明名称 CHARGED PARTICLE BEAM FABRICATION OF MICROELECTRONIC CIRCUIT PATTERNS
摘要 1,211,618. Electron and ion beam apparatus. GENERAL ELECTRIC CO. 20 Aug., 1968 [28 Sept., 1967], No. 17017/69. Addition to 1,211,616. Heading HID. The subject-matter of this Specification is identical with that described in the parent Specification, but the claims are concerned with the combination of the "course" scanning deflection system for deflecting the beam over the lens array, the lens array and the "fine" deflection system for deflecting the charged particles emerging from the lens array over the target.
申请公布号 GB1211618(A) 申请公布日期 1970.11.11
申请号 GB19690017017 申请日期 1968.08.20
申请人 GENERAL ELECTRIC COMPANY 发明人
分类号 H01J37/30;H01J37/302;H01J37/317;H01L21/00 主分类号 H01J37/30
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