发明名称 A DEVICE AND METHOD FOR FINELY ADJUSTING HEIGHT OF COATING REGION STAGE OF A SUBSTRATE FLOATING UNIT, AND A SUBSTRATE FLOATING UNIT AND A COATING APPARATUS HAVING THE SAME
摘要 PURPOSE: An apparatus for adjusting detail height of coating area stage of a substrate floating unit is provided to improve uniformity and to minimize spot occurrence. CONSTITUTION: An apparatus for adjusting detail height of coating area stage comprises: a detail height controlling member having a plurality of plates at the lower part; a measuring device for continuously measuring the coating height; and a controller which is connected to the plural height controlling members and measuring device and controls operation of the plural height controlling members. The plural height controlling member is operated by piezo actuator.
申请公布号 KR20110032673(A) 申请公布日期 2011.03.30
申请号 KR20090090286 申请日期 2009.09.23
申请人 NARAENANOTECH CORPORATION 发明人 KIM, MIN HO
分类号 B05B13/02;B05C13/02;H01L21/02 主分类号 B05B13/02
代理机构 代理人
主权项
地址