| 摘要 |
<p>PURPOSE: A coating and developing system is provided to appropriately suppress the height and length of a device by securing high return efficiency in an apparatus. CONSTITUTION: In a coating and developing system, a carrier(20) accommodates 13 wafers(W) with airtight. A carrier block(S1) loads/ unloads the carrier in/ from the coating and developing system. An opening(22) and a transfer arm(IC) is installed in a placement table(21) and the front wall of the placement table(21) in the carrier block. A processing block(S2) and an interface block(S3) perform a coat processing and a developing process of the wafer. The processing block comprises a first unit block laminate(41) and a second unit block laminate(42).</p> |
