发明名称 |
PLASMA REACTOR HAVING MULTI-PLASMA AREA |
摘要 |
PURPOSE: A plasma reactor having a multi-plasma area is provided to minimize the interference between each partitioned plasma area by arranging an electrode for preventing interference to divide the plasma area. CONSTITUTION: In a plasma reactor having a multi-plasma area, a reaction chamber has an internal processing space. A plasma source supply unit guides plasma discharge to the internal processing space of the reaction chamber. A power supply unit(60) supplies frequency power to a plasma source supply unit. An electrode for preventing interference divides the internal processing chamber into at least two. An independent plasma area is respectively formed in spaces which are divided by the electrode.
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申请公布号 |
KR20110032374(A) |
申请公布日期 |
2011.03.30 |
申请号 |
KR20090089822 |
申请日期 |
2009.09.22 |
申请人 |
NEW POWER PLASMA CO., LTD. |
发明人 |
NAM, CHANG WOO;WI, SOON IM |
分类号 |
H01L21/205;H01L21/3065 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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