发明名称 Semiconductor on insulator (SOI) device including a discharge path for a decoupling capacitor
摘要 A silicon on insulator (SOI) device is provided. The device includes an MOS capacitor coupled between voltage busses and formed in a monocrystalline semiconductor layer overlying an insulator layer and a semiconductor substrate. The device includes at least one electrical discharge path for discharging potentially harmful charge build up on the MOS capacitor. The MOS capacitor has a conductive electrode material forming a first plate of the MOS capacitor and an impurity doped region in the monocrystalline silicon layer beneath the conductive electrode material forming a second plate. A first voltage bus is coupled to the first plate of the capacitor and to an electrical discharge path through a diode formed in the semiconductor substrate and a second voltage bus is coupled to the second plate of the capacitor.
申请公布号 US7915658(B2) 申请公布日期 2011.03.29
申请号 US20100727027 申请日期 2010.03.18
申请人 GLOBALFOUNDRIES INC. 发明人 PELLELA MARIO M.;WU DONGGANG D.;BULLER JAMES F.
分类号 H01L27/108 主分类号 H01L27/108
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