发明名称 Semiconductor device and method for fabricating the same
摘要 A semiconductor device includes: an isolation region formed in a semiconductor substrate; active regions surrounded by the isolation region and including p-type and n-type regions, respectively; an NMOS transistor formed in the active region including the p-type region and including an n-type gate electrode; a PMOS transistor formed in the active region including the n-type region and including a p-type gate electrode; and a p-type resistor formed on the isolation region. The p-type resistor has an internal stress greater than that of the p-type gate electrode.
申请公布号 US7915131(B2) 申请公布日期 2011.03.29
申请号 US20100914026 申请日期 2010.10.28
申请人 PANASONIC CORPORATION 发明人 NAKAGAWA RYO;YAMADA TAKAYUKI
分类号 H01L21/336;H01L21/76;H01L21/8238 主分类号 H01L21/336
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