发明名称 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
摘要 |
In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component analysis is applied to the difference spectra to obtain a calibration function that is less sensitive to variations in the underlying structure than a calibration function obtained from spectra obtained from a single target.
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申请公布号 |
US7916284(B2) |
申请公布日期 |
2011.03.29 |
申请号 |
US20060488170 |
申请日期 |
2006.07.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DUSA MIRCEA;DEN BOEF ARIE JEFFREY;CRAMER HUGO AUGUSTINUS JOSEPH |
分类号 |
G01B9/00;G01B11/04;G01B11/14;G01B11/30;G03C5/00;G03F9/00 |
主分类号 |
G01B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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