发明名称 PLASMA SOURCE
摘要 FIELD: electricity. ^ SUBSTANCE: plasma source (1) comprises several ionising electrodes (4) and ionising chamber (2) with inlet nozzle (3) for introduction of gas and outlet hole (9) for dosing of ionised gas to the object. Ionising electrodes (4) are located in parallel to each other to form an equilateral polygon in cross section. Ratio of distance (dEe) electrode-electrode, at one side, and distance (dEW) electrode-wall, at the other side, when measured at the end of ionising electrodes (4), is within 1.8-2.2. ^ EFFECT: simplifying discharge initiation and to increase stability of electrodes operation. ^ 17 cl, 9 dwg
申请公布号 RU2415522(C2) 申请公布日期 2011.03.27
申请号 RU20080114816 申请日期 2006.09.11
申请人 MAKS-PLANK-GEZELL'SHAFT TSUR FERDERUNG DER VISSENSHAFTEN E.F.;ADTEK JUROP LIMITED 发明人 MORFILL' GREGOR;SIMIZU TETSUDZI;SHTEFFES BERND;FUDZII SUITSU
分类号 H05H1/24 主分类号 H05H1/24
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