| 摘要 |
A method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) array substrate comprises: forming a gate line and a gate electrode on a base substrate, and then depositing a gate insulating layer on the base substrate; forming an active layer, a data line, a source electrode, and a drain electrode on the gate insulating layer, and removing the gate insulating layer in the region other than the regions of the active layer, the data line, the source electrode and the drain electrode; forming a first via hole, a second via hole and a third via hole in a photoresist layer by an exposing and developing process; and forming a pixel electrode, a first connection electrode and a second connection electrode on the photosensitive resin layer. The pixel electrode is connected with the drain electrode through the third via hole.
|
