发明名称 Silicon Texturing Formulations for Solar Applications
摘要 The current invention describes a process and texturing solution for texturing a crystalline silicon substrate to provide a light trapping surface within a crystalline silicon based solar cell. In an embodiment the texturing process includes a pre-treatment of hydrofluoric acid followed by the application of a texturing solution that includes potassium hydroxide (KOH) and butanol. The application of the texturing solution may be followed by a hydrofluoric acid post-treatment. A combinatorial method of optimizing the textured surface of a crystalline silicon substrate is also described.
申请公布号 US2011070744(A1) 申请公布日期 2011.03.24
申请号 US20100885360 申请日期 2010.09.17
申请人 发明人 SUN ZHI-WEN;NGUYEN MINH ANH
分类号 H01L21/306;C09K13/02 主分类号 H01L21/306
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