发明名称 IN SITU EMISSION MEASUREMENT FOR PROCESS CONTROL EQUIPMENT
摘要 A system and method for accurately measuring supply gas consumed by a particular process control component within a process control system is disclosed. Enhanced measurement accuracy is derived from measuring the consumption of the process control component in a normal operating mode of the process control system. The amount of fluid expended by one process control component is separated by a fluid control system from the amount of supply gas expended in actuating other process control components. The amount of fluid expended by each component may be determined by measuring a decrease in a fluid within a vessel having a known quantity that independently supplies supply gas to each component during its operation.
申请公布号 US2011071688(A1) 申请公布日期 2011.03.24
申请号 US20100887791 申请日期 2010.09.22
申请人 FISHER CONTROLS INTERNATIONAL LLC 发明人 LOVELL MICHEL K.;CARTWRIGHT CARTER B.
分类号 G06F19/00;G01F1/34;G05D7/00 主分类号 G06F19/00
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