发明名称 PHOTOCURABLE TRANSFER SHEET, AND METHOD FOR FORMING RECESSED AND PROJECTED PATTERN USING SAME
摘要 <p>Disclosed is a photocurable transfer sheet which can be advantageously used for the production of an intermediate stamper that is used in a nanoimprinting process. The photocurable transfer sheet exhibits excellent releasability from a mold, which is used for the production of the intermediate stamper and has a fine recessed and projected pattern, and also exhibits excellent releasability from a photocurable resin to which a recessed and projected pattern is transferred from the intermediate stamper. In addition, the photocurable transfer sheet exhibits excellent transferability of a recessed and projected pattern. Also disclosed is a method for forming a fine recessed and projected pattern using the photocurable transfer sheet. Specifically disclosed is a photocurable transfer sheet (10) which comprises a photocurable transfer layer (11) that can be deformed by the application of a pressure and is composed of a photocurable composition that contains a polymer and a reactive diluent agent. The photocurable transfer sheet (10) is characterized in that the polymer is composed of an acrylic resin that contains a (meth)acrylate repeating unit having an alicyclic group. Also specifically disclosed is a method for forming a recessed and projected pattern using the photocurable transfer sheet (10).</p>
申请公布号 WO2011034123(A1) 申请公布日期 2011.03.24
申请号 WO2010JP66020 申请日期 2010.09.16
申请人 BRIDGESTONE CORPORATION;INAMIYA TAKATO;HASHIMOTO MASASHI;KAIDA EIZOU 发明人 INAMIYA TAKATO;HASHIMOTO MASASHI;KAIDA EIZOU
分类号 H01L21/027;B29C33/38;B29C59/02;B29K33/04;B32B3/26;B32B3/30;B32B27/30 主分类号 H01L21/027
代理机构 代理人
主权项
地址