METHOD AND APPARATUS FOR CLEANING A FILM SEPERATING DEVICE

摘要

A method for cleaning a film separating device involves: a) performing positive-direction water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is less than 1.2; b) performing reverse water cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 1.2; c) performing reverse chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 2; d) performing positive-direction chemical cleaning when the ratio between the film filter resistance and the preliminary film filter resistance is greater-than or equal-to 3.