METHOD FOR DETERMINING WHETHER PROCESSING CAN BE INITIATED, AND STORAGE MEDIUM

摘要

PURPOSE: A method for determining whether to start a process in a substrate processing device and a recording medium are provided to accurately sense the change of the number of corpuscles by approximating the change of the number of the corpuscles remaining on the substrate processing device with an exponential function. CONSTITUTION: A chamber(11) receives a wafer. An exhaust system(14) exhausts a chamber. A seasoning process of a higher temperature and/or lowerer temperature atmosphere than a plasma etching process is repeated for a preset number of times. The number of particles flowing in a first exhaust line(15) of the exhaust system is measured. The change of the measured particles is measured according to the lapse of time. When the decrease of the number of the particles is changed, it is determined that a plasma etching process can begin.