| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing exposure processing with accuracy by preventing deterioration in a pattern image, when exposing a pattern onto a substrate via a projection optical system and a liquid. <P>SOLUTION: The exposure apparatus exposes the substrate by projecting the pattern image onto the substrate via the projection optical system and the liquid; the exposure apparatus is provided with a liquid supply mechanism 10 near the terminal end of the projection optical system to supply the liquid; a minute gap 100 is formed between a side 2T of the liquid supply mechanism and a side 30T of an optical member of the terminal end of projection optical system, which makes contact with the liquid; and at least one of the side 30T of the liquid supply mechanism and the side 2T of the optical member of the terminal end is subjected to liquid-repellent treatments 101A and 101B. <P>COPYRIGHT: (C)2011,JPO&INPIT |
