| 摘要 |
A method for forming a CMOS image sensing pixel, which is configured to determine a color, includes providing an n-type substrate that includes a first thickness and a first width. The method also includes forming a p-type layer, the p-type layer overlaying the n-type substrate. The p-type layer includes a second thickness and a second width. The second thickness and the second width are associated with a light characteristic. The method additionally includes forming an n-type layer, the n-type layer overlaying the p-type layer. The n-type layer includes a third thickness and a third width. In addition, the method includes forming a pn junction between the p-type layer and the n-type layer. The pn junction includes a fourth width. The method also includes providing a control circuit. The control circuit is electrically coupled to the n-type substrate.
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