发明名称 FORMING RADIO FREQUENCY INTEGRATED CIRCUITS
摘要 Method of forming a radio frequency integrated circuit (RFIC) is provided. The RFIC comprises one or more electronic devices formed in a semiconductor substrate and one or more passive devices on a dielectric substrate, arranged in a stacking manner. Electrical shield structure is formed in between to shield electronic devices in the semiconductor substrate from the passive devices in the dielectric substrate. Vertical through-silicon-vias (TSVs) are formed to provide electrical connections between the passive devices in the dielectric substrate and the electronic devices in the semiconductor substrate.
申请公布号 US2011068433(A1) 申请公布日期 2011.03.24
申请号 US20090566338 申请日期 2009.09.24
申请人 QUALCOMM INCORPORATED 发明人 KIM JONGHAE;HENDERSON BRIAN M.;NOWAK MATTHEW M.;XU JIAYU
分类号 H01L25/16;H01L21/02;H01L21/50 主分类号 H01L25/16
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