RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND

摘要

Disclosed is a radiation-sensitive resin composition which comprises a polymer (A) that has an acid-cleavable group, an acid generator (B) that generates an acid when irradiated with radiation, and a polymer (C) that has a functional group represented by general formula (x) and a fluorine atom. In the radiation-sensitive resin composition, the polymer (C) has a higher fluorine atom content than the polymer (A). (In general formula (x), R1 represents an alkali-dissociating group, and A represents an oxygen atom (excluding one directly bonded to an aromatic ring, a carbonyl group or a sulfoxyl group), an imino group, a -CO-O-* group or an -SO2-O-* group (wherein "*" represents a bonding hand that is bonded to R1).)