| 摘要 |
A method of making a coated body including a coating and a substrate where, onto said substrate, a coating is deposited, using a PVD deposition process. The coating includes a nitride, carbide, oxide, boride or mixtures thereof, of one or more elements selected from groups IVb, Vb, VIb of the periodic table and Al, Y and Si. The deposition process includes at least one sequence of varying the substrate bias voltage, while maintaining the active targets. The sequence of varying the substrate bias voltage includes a subsequence Si including depositing at a first substrate bias voltage, Bi, for a deposition time, Ti, of between 10 seconds and 60 minutes, then, during a ramping time, Ri, of between 10 seconds and 40 minutes, while depositing, gradually changing the substrate bias voltage to a second substrate bias voltage Bi+1, where |Bi−Bi+1|≧10 V. The subsequence, Si, is repeated until i=n where i=0, 1, 2, . . . n, where n≧2, and where each new subsequence starts the deposition at the same substrate bias voltage used when ending the previous subsequence. |
