RESIN COMPOSITION FOR PREPARING OF REVERSAL IMPRINT MOLD, AND REVERSAL IMPRINT METHOD USING THE MOLD

摘要

PURPOSE: A resin composition for preparing a reversal imprint mold is provided to ensure excellent durability of nano patterns, to facilitate the manufacture of a reversal imprint mold with a high resolution of 50nm or less, and to increase a transcription rate of a polymer resin thin film or pattern due to uniform contact with a substrate. CONSTITUTION: A resin composition for preparing a reversal imprint mold includes 10 ~ 30 weight% of a photoreactive polymer, 60 ~ 90 weight% of a photoreactive monomer, and 1 ~ 10 weight% of photoinitiator, wherein the viscosity of the reversal imprint mold is 5 ~ 1000 cp. The resin composition further includes 1 ~ 50 parts by weight of release agent based on 100 parts by weight of the sum of three kinds of components.