发明名称 SEMICONDUCTOR SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor sensor includes: a semiconductor substrate; a plurality of piezoelectric thin films layered on the semiconductor substrate, the plurality of piezoelectric thin films including at least a pair of the piezoelectric thin films layered above and below; a pair of electrodes that are formed at an interface of at least the pair of the piezoelectric thin films layered above and below and excite surface acoustic waves; a thin film directly under a lowest-layer piezoelectric film of the piezoelectric thin films; a metal thin film that is formed at an interface of the lowest-layer piezoelectric thin film and the thin film, and facilitate a growth of a ridge-and-valley portion on a surface of an uppermost-layer piezoelectric thin film of the piezoelectric thin films; and a sensitive film for molecular adsorption formed on at least the ridge-and-valley portion on the uppermost-layer piezoelectric thin film.
申请公布号 US2011067484(A1) 申请公布日期 2011.03.24
申请号 US20100951436 申请日期 2010.11.22
申请人 SEIKO EPSON CORPORATION 发明人 TAKIZAWA TERUO;KONDO TAKAYUKI;TODOROKIHARA MASAYOSHI
分类号 G01N33/00 主分类号 G01N33/00
代理机构 代理人
主权项
地址