发明名称 |
COPPER METAL FILM, METHOD FOR PRODUCING SAME, COPPER METAL PATTERN, CONDUCTIVE WIRING LINE USING THE COPPER METAL PATTERN, COPPER METAL BUMP, HEAT CONDUCTION PATH, BONDING MATERIAL, AND LIQUID COMPOSITION |
摘要 |
Disclosed are: a copper metal film which has good adhesion to a substrate, low volume resistivity, and good deep-part metal properties; and a method for producing a copper metal film, wherein the copper metal film can be produced by reducing a substrate to a deep part thereof without damaging the substrate. Specifically disclosed is a copper metal film that is characterized by being obtained by processing a copper-based particle deposited layer, which contains copper oxide as well as a transition metal in the form of a metal, an alloy or a transition metal complex containing a metal element, with a gaseous formic acid and/or formaldehyde that is heated to 120°C or higher. The copper oxide is preferably copper (I) oxide and/or copper (II) oxide. The transition metal, alloy or metal complex are preferably a metal selected from the group consisting of Cu, Pd, Pt, Ni, Ag, Au and Rh, an alloy containing the metal, or a complex containing the metal element, respectively. |
申请公布号 |
WO2011034016(A1) |
申请公布日期 |
2011.03.24 |
申请号 |
WO2010JP65698 |
申请日期 |
2010.09.13 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD.;NAKAKO, HIDEO;YAMAMOTO, KAZUNORI;KUMASHIRO, YASUSHI;YOKOZAWA, SHUNYA;MASUDA, KATSUYUKI;EJIRI, YOSHINORI;INADA, MAKI;KURODA, KYOUKO |
发明人 |
NAKAKO, HIDEO;YAMAMOTO, KAZUNORI;KUMASHIRO, YASUSHI;YOKOZAWA, SHUNYA;MASUDA, KATSUYUKI;EJIRI, YOSHINORI;INADA, MAKI;KURODA, KYOUKO |
分类号 |
C23C20/02;B22F1/02;H01B1/20;H01B5/14;H01B13/00;H05K1/09 |
主分类号 |
C23C20/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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