| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of precisely driving a stage for holding a wafer. <P>SOLUTION: A measurement arm 71A positioned within a space surrounded by a slight movement stage WFS1 and a rough movement stage WCS1 for supporting the slight movement stage WFS1 includes an encoder head, applies measurement beams to a grating RG provided in the slight movement stage WFS1 by the head, and receives return beams from the grating RG. Based on output of the head, a slight movement stage position measurement system measures position information of the slight movement stage WFS1. A measurement arm position measurement system 72A<SB>0</SB>measures relative position information to a light axis AX of the measurement arm 71A. Thus, based on measurement results of the slight movement stage position measurement system and the measurement arm position measurement system 72A<SB>0</SB>, the position information of the slight movement stage WFS1 in reference to the light axis AX is measured precisely. <P>COPYRIGHT: (C)2011,JPO&INPIT |
