| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering system which can satisfactorily deposit a thin film on a substrate. SOLUTION: A time check is started in such a manner that a normal discharge timing previously detected by either current detection part selected from the first current detection part 15 and the second current detection part 16 is used as a trigger. To a cathode in which the normal discharge timing has been detected by the other current detection part, a time difference between the normal discharge timing detected by either current detection part and the normal discharge timing detected by the other current detection part is obtained. Then, the voltage to be applied is set in such a manner that discharge is finished at the point of time in which the time obtained by adding the time difference to a prescribed time is measured. COPYRIGHT: (C)2011,JPO&INPIT
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