RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN FORMATION METHOD

摘要

A radiation-sensitive resin composition which can be used as a radiation-sensitive resin composition for use in a resist pattern formation method, which comprises a polymer (A), a radiation-sensitive acid generator (B), and a solvent (C), wherein the polymer (A) has at least one repeating unit selected from the group consisting of repeating units respectively represented by general formulae (1-1) to (1-4) (wherein R1 represents a hydrogen atom, a trifluoromethyl group, or an alkyl group having 1 to 3 carbon atoms; R2sindependently represent a hydrogen atom or a hydroxy group; R3 represents a hydroxyalkyl group; A represents an alkylene group; and B represents an ester bond, an amide bond, a carbonyl group or an amino group) and a repeating unit having an acid labile group.