| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of removing liquid remaining on a slight movement stage. <P>SOLUTION: By projecting exposure light via liquid, a wafer W held by the slight movement stage WFS1 on a wafer stage (rough movement stage) is exposed to light. After completion of exposure, the slight movement stage WFS1 is carried to a wafer exchange position for exchanging wafers. In parallel with operation of the wafer exchange, liquid remaining inside a wafer holder WH of the slight movement stage WFS1 is sucked and removed via piping 80a by a non-illustrated vacuum pump. <P>COPYRIGHT: (C)2011,JPO&INPIT |
