| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus, an exposure method and a method of manufacturing a device, which suppress poor exposure. <P>SOLUTION: The exposure apparatus irradiates a substrate held on a stage with exposure light via a first fluid which is in contact with a part of the top surface of the substrate. The stage includes one or more lyophilic regions lyophilic to a second fluid and arranged to surround the substrate, and a system of supplying the second fluid to the lyophilic regions. <P>COPYRIGHT: (C)2011,JPO&INPIT |
