发明名称 IONIZATION SPUTTERING VACUUM PUMP
摘要 PROBLEM TO BE SOLVED: To provide an ionization sputtering vacuum pump in which a reduction of evacuation speed in an ultrahigh vacuum region is minimized by introducing thermal electrons from an extra-ultrahigh vacuum region. SOLUTION: In the ionization sputtering vacuum pump, 2n (n=1, 2, 3 ...) pieces of plate magnetron type ion pump elements are arranged in opposition, probability of collision of ions and electrons due to a high-frequency electric field generated by supplying high-frequency power to a high frequency coil arranged at an intermediate part of above is improved, and ionization of a dielectric is promoted, a cylindrical anode is fitted at the intermediate part, thermoelectrons are supplied from a thermoelectron source arranged at a periphery to face to the anode, and discharge in an ultrahigh/extra ultrahigh vacuum region is made to continue. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011060430(A) 申请公布日期 2011.03.24
申请号 JP20090205287 申请日期 2009.09.04
申请人 SANYU ELECTRON CO LTD 发明人 MUROTA MASAO;GOTO SHUICHI
分类号 H01J41/16;F04B37/14 主分类号 H01J41/16
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