发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device suppressing deterioration of a device working rate resulting from performing a wafer recovery work or the like by performing retry processing even if predetermined processing stops due to a failure. SOLUTION: The substrate processing device includes a conveyance means conveying a wafer 1 and a control means controlling the conveyance means. When the conveyance means is stopped temporarily due to the occurrence of an error in conveying the substrate, the control means causes the conveyance means to shift to a standby state (command input waiting state) in a case where the error is not resolved even if the control means causes the conveyance means to perform the retry processing a predetermined number of times. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011061008(A) 申请公布日期 2011.03.24
申请号 JP20090209151 申请日期 2009.09.10
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 OKUNO MASANORI
分类号 H01L21/677;H01L21/02;H01L21/304 主分类号 H01L21/677
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