A PVD METHOD FOR DEPOSITING A COATING ONTO A BODY AND COATED BODIES MADE THEREOF

摘要

The present invention relates to a method of making a coated body comprising a coating and a substrate where onto said substrate a coating is deposited, using a PVD deposition process. The coating comprises a nitride, carbide, oxide, boride or mixtures thereof, of one or more elements selected from groups IVb, Vb, VIb of the periodic table and Al, Y and Si. The deposition process comprises at least one sequence of varying the substrate bias voltage, while maintaining the active targets, where the sequence of varying the substrate bias voltage comprises a subsequence Si; - depositing at a first substrate bias voltage, Bi, for a deposition time, Ti, of between 10 seconds and 60 minutes, then, during a ramping time, Ri, of between 10 seconds and 40 minutes, while depositing, gradually changing the substrate bias voltage to a second substrate bias voltage Bi+1, where |Bi-Bi+1| = 10 V, the subsequence, Si, is repeated until i=n where i=0, 1, 2,...n, where n=2, and where each new subsequence starts the deposition at the same substrate bias voltage used when ending the previous subsequence.