发明名称 |
VACUUM DEPOSITION APPARATUS AND METHOD OF PRODUCING VAPOR-DEPOSITED FILM |
摘要 |
This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means (18) equalizes the circumference velocity v1 of the coating roll (14) and the circumference velocity v2 of the takeup guide roll (15). Hence, v1 = v2. Therefore, the takeup guide roll (15) never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties. <IMAGE> |
申请公布号 |
EP1593754(A4) |
申请公布日期 |
2011.03.23 |
申请号 |
EP20030782915 |
申请日期 |
2003.12.26 |
申请人 |
TOPPAN PRINTING CO., LTD.;APPLIED MATERIALS GMBH & CO. KG |
发明人 |
SASAKI, NOBORU;SUZUKI, HIROSHI;KOIZUMI, FUMITAKE;IMAI, NOBUHIKO;ARAI, KUNIMASA;KONAGAI, HIROYUKI |
分类号 |
C23C14/56 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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