发明名称 THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A thin film transistor and a method for manufacturing the same are provided to configure a channel layer using a combination of new materials except indium, thereby saving production costs. CONSTITUTION: A source electrode(14a) and a drain electrode(14b) are formed on a substrate(100). A channel layer(13) contacts the source electrode and the drain electrode. The channel layer is formed by pulse laser deposition. A gate insulating film(12) contacts the channel layer, the source electrode, and the drain electrode. A gate electrode(11) contacts the gate insulating film.</p>
申请公布号 KR20110030055(A) 申请公布日期 2011.03.23
申请号 KR20090087989 申请日期 2009.09.17
申请人 KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 LEE, SANG YEOL;JO, KYOUNG CHUL;LEE, DEUK HEE
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
主权项
地址