发明名称 |
THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A thin film transistor and a method for manufacturing the same are provided to configure a channel layer using a combination of new materials except indium, thereby saving production costs. CONSTITUTION: A source electrode(14a) and a drain electrode(14b) are formed on a substrate(100). A channel layer(13) contacts the source electrode and the drain electrode. The channel layer is formed by pulse laser deposition. A gate insulating film(12) contacts the channel layer, the source electrode, and the drain electrode. A gate electrode(11) contacts the gate insulating film.</p> |
申请公布号 |
KR20110030055(A) |
申请公布日期 |
2011.03.23 |
申请号 |
KR20090087989 |
申请日期 |
2009.09.17 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
LEE, SANG YEOL;JO, KYOUNG CHUL;LEE, DEUK HEE |
分类号 |
H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|