发明名称 HYBRID SILICON WAFER AND METHOD FOR MANUFACTURING SAME
摘要 <p>Provided is a hybrid silicon wafer comprising a structure in which a single-crystal wafer is embedded in a sintered polysilicon wafer. Also provided is a method for manufacturing a hybrid silicon wafer having a structure in which a single-crystal wafer is embedded in a sintered polysilicon wafer, wherein a part of the sintered polysilicon is hollowed, a single crystal ingot is inserted into the hollowed portion, these are mutually bonded through thermal diffusion bonding based on HIP to prepare a complex of the sintered polysilicon and the single-crystal silicon ingot, and the complex is sliced. Thereby provided are a hybrid silicon wafer comprising functions of both the polysilicon wafer and the single-crystal wafer, and a method for manufacturing such a hybrid silicon wafer.</p>
申请公布号 EP2299474(A1) 申请公布日期 2011.03.23
申请号 EP20090794309 申请日期 2009.06.23
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 SATOH KAZUYUKI;KOIDO YOSHIMASA
分类号 H01L21/02;C04B37/00;C30B33/06 主分类号 H01L21/02
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