发明名称 |
Method and apparatus of using solution based precursors for atomic layer deposition |
摘要 |
The invention relates to a method of delivering a vaporized solution precursor to an atomic layer deposition chamber, comprising connection a vaporizer to the chamber and delivering a vaporized solution precursor from the vaporizer to the chamber, when the vaporizer is operated at a constant pressure. |
申请公布号 |
EP2298957(A2) |
申请公布日期 |
2011.03.23 |
申请号 |
EP20100012891 |
申请日期 |
2006.04.25 |
申请人 |
LINDE LLC |
发明人 |
HOGLE, RICHARD, ALLEN;HELLY, PATRICK, JOSEPH;WANG, QING, MIN;MA, CE |
分类号 |
C23C16/455;C23C16/448 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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