EXTREME UV RADIATION REFLECTING ELEMENT COMPRISING A SPUTTER-RESISTANT MATERIAL

摘要

The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of≰5 nm and essentially made out of a material with a sputter resistance of≰10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.