发明名称 Determining distortion measures in a pattern recognition process
摘要 A method for determining a set of distortion measures in a pattern recognition process, where a sequence of feature vectors is formed from a digitized incoming signal to be recognized, said pattern recognition being based upon said set of distortion measures. The method comprises comparing (S10) a first feature vector in said sequence with a first number (M1) of templates from a set of templates representing candidate patterns, based on said comparison, selecting (S12) a second number (M2) of templates from said template set, the second number being smaller than the first number, and comparing (S14) a second feature vector only with said selected templates. The method can be implemented in a device for pattern recognition.
申请公布号 US7912715(B2) 申请公布日期 2011.03.22
申请号 US20030402371 申请日期 2003.03.27
申请人 NOKIA CORPORATION 发明人 VASILACHE MARCEL
分类号 G10L15/04;G06K9/68;G10L15/10 主分类号 G10L15/04
代理机构 代理人
主权项
地址